The use of alignment marks in electron-beam lithography is crucial for aligning different layers of lithography, enabling precise printing of intricate patterns like wires connecting pads. This guide explores the significance of alignment marks, common alignment strategies, differences in alignment

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In the process of electron-beam lithography with the Raith EBPG, selecting parameters such as resist type, resist thickness, spot size, dose range, resist sensitivity, and beam step size is crucial for achieving precise patterns. Factors like the substrate, developer, and pattern transfer technique

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