Sputtering systems, including DC and RF sputtering, are used for thin film deposition of metals, dielectrics, and alloys. This process involves ejecting atoms from a solid target material through bombardment by energetic particles. The efficiency of sputtering is measured by sputter yield, which dep

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The study investigated the targeted and measured concentrations of Ti and Zr in magnetron-sputtered coatings, their impact on conversion layer thickness, and the relative atomic concentrations in hydrothermal conversion layers on Al-12Zr and Al-12Ti. Open circuit potential values before and after hy

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This document explores a novel method for phase locking magnetrons, essential for various high-power RF applications. Traditional methods involve injecting RF signals through additional components, leading to complexity and inefficiency. The proposed method utilizes varactor diodes and feedback loop

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